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MgAl2O4 siv lead ua Substrates

DescriptionTransparent tej hub spinel (pob tshab Magnesium Aluminate spinel, MgAl2O4 spinel pob tshab, MA polycrystalline spinel) yog ib qho khoom kom zoo saib rau siv rau ntau yam kev kho qhov muag, ele

Xa kev nugTsham tam sim no
Txhawb tshuaj

Hauj lwm lawm

Pob tshab tej hub spinel (pob tshab Magnesium Aluminate spinel, MgAl2O4 spinel pob tshab, MA polycrystalline spinel) yog ib qho khoom kom zoo saib rau siv rau ntau yam kev kho qhov muag, hauv thiab yam ntxwv daim ntaub ntawv nrog rau cov qhov rai thiab lo ntsiab muag, uas yuav tsum tau cov mob kis los ntawm qhov pom mus rau lub mid IR. Theoretical kis tau tus mob no heev yam thiab txuas 87% ntawm 0.3 5 microns. Cov yam ntxwv kis rival cov ALON thiab cov sapphire hauv lub mid-yoj IR, ua kom zoo tshwj xeeb tshaj yog saib rau puas tau-ua kev kawm yuav tsum tam sim no thiab cim ntxiv mus IR kev tshuab.

Specification

Polishing Specifications rau Substrate GradeⅠ

Orientation Tolerence

CHOJ 30ˊ

Thickness/taub kam rau ua

hli ±0.10

Flatness deg

<(Λ-2λ) @632nm

Deg zoo

nm (1.0-2.0)

Mus tib seem

10ˊ

Perpendicular

60ˊ

Chammfer

choj 0.2 × 45 °


Polishing Specification Substrate rau cov qib Ⅱ

Orientation Tolerence

CHOJ 18ˊ

Thickness/taub kam rau ua

hli ±0.05

Flatness deg

<(Λ/2-λ/4) @632nm

Deg zoo

(0.3-1.0) nm

Mus tib seem

Perpendicular

30ˊ

Chammfer

choj 0.2 × 45 °


Polishing Specification Substrate rau cov qib Ⅲ

Orientation Tolerence

CHOJ 12ˊ

Thickness/taub kam rau ua

hli ±0.02

Flatness deg

@632nm (λ/4-λ/6)

Deg zoo

choj 0.3nm

Mus tib seem

45〞

Perpendicular

20ˊ

Chammfer

choj 0.2 × 45 °

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