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Siv lead ua ZnO Substrates

DescriptionZinc Oxide (ZnO) yuav tau los ua ib tug siv lead ua ib semiconductor uas muaj zog heev nthuav. Tus bandgap yog nyob rau hauv tus 3.4 eV khwv uas kom nyabxeeb zoo txaus rau lub xiav thiab viole

Xa kev nugTsham tam sim no
Txhawb tshuaj

Hauj lwm lawm

Zinc Oxide (ZnO) yuav tau los ua ib tug siv lead ua ib semiconductor uas muaj zog heev nthuav. Tus bandgap yog nyob hauv tus 3.4 eV khwv uas kom nyabxeeb zoo txaus rau lub xiav thiab violet kev siv hauv opto-electronics raws li UV pab kiag li lawm. Nws tseem muaj nyob rau hauv bulks, nyob hauv cov wafers uas muaj txog li 2 nti, uas yuav qhia nws ib qho loj kom zoo dua Gallium Nitride thiab lwm pab pawg III Nitrides.

Specification

Polishing Specifications rau Substrate GradeⅠ

Orientation Tolerence

CHOJ 30ˊ

Thickness/taub kam rau ua

hli ±0.10

Flatness deg

<(Λ-2λ) @632nm

Deg zoo

nm (1.0-2.0)

Mus tib seem

10ˊ

Perpendicular

60ˊ

Chammfer

choj 0.2 × 45 °


Polishing Specification Substrate rau cov qib Ⅱ

Orientation Tolerence

CHOJ 18ˊ

Thickness/taub kam rau ua

hli ±0.05

Flatness deg

<(Λ/2-λ/4) @632nm

Deg zoo

(0.3-1.0) nm

Mus tib seem

Perpendicular

30ˊ

Chammfer

choj 0.2 × 45 °


Polishing Specification Substrate rau cov qib Ⅲ

Orientation Tolerence

CHOJ 12ˊ

Thickness/taub kam rau ua

hli ±0.02

Flatness deg

@632nm (λ/4-λ/6)

Deg zoo

choj 0.3nm

Mus tib seem

45〞

Perpendicular

20ˊ

Chammfer

choj 0.2 × 45 °

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